原文传递 Instrumentation Up-Fit for Reactive Nanolaminate PVD.
题名: Instrumentation Up-Fit for Reactive Nanolaminate PVD.
作者: Maria, J.
关键词: Physical vapor deposition, Magnetrons, Sputtering, Layers, Electron beams, Evaporation, Pulsed lasers, Nanoenergetics, Laminates, Nanomaterials, Ignition, Pvd (physical vapor deposition), Multilayer, Magnetron sputtering, E-beam (electron beam), E-beam evaporation, Pld (pulsed laser deposition), Multi-modal energy flow, Atomically engineered interfaces, Reactive nanolaminates, Tunableignition
摘要: PI Maria conducted an instrument upfit for physical vapor deposition (PVD) systems that combines electron beam (e-beam) evaporation with magnetron sputtering and pulsed laser deposition. The original instrumentation was supported by a 2014 DURIP award to enable clean, uniform, and rapid deposition of a wide variety of metallic, semiconducting, and ceramic thin films that serve multiple current and pending DoD programs at NCSU. While this instrumentation benefits several programs, its primary role is to support nanoenergetic materials research and the new NCSU-led MURI: Multi-modal Energy Flow at Atomically Engineered Interfaces.
报告类型: 科技报告
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